Semiconductor
Wafer Spin Coater - CIS

CSC Series

CSC-300

QMC CSC-300설비는 Back-end 공정 완료 전까지 진행 중 발생되는 파티클과 진행중 발생하는 Damage로부터 CIS Die표면을 보호하기 위하여 공정 Wafer 표면에 보호 용액을 도포(Coating)하는 장비입니다.

OUTPUT


 

FEATURES
  • Coating Uniformity; ±15% @ Thk. 1.1 μm
  • Temperature Uniformity; ± 3 ℃ @ ≤ 200
SPECIFICATION
Item CSC-300
Wafer Size 8 ~ 12”
Wafer Supply Load Port (FOUP)
Transfer Travel type Robot (Dual Arm)
Wafer Align Accuracy X, Y ≤ ±0.5mm
Configuration Load Port, ATM Robot, Pre-Cleaning, Coating, Baking, Cooling, Nozzle
System Dimension(W x D x H) 2,220 mm x 3,060 mm x 2,020 mm
Coating Unit A/C Servo Motor Drive
Chuck Rotate Speed: MAX. 3000 RPM
Uniformity Coating Thickness ≤ ±15% @ 1~3um
Bake Zone Max Temp. 200 °C
Temp. Uniformity ≤ ± 3℃
Cooling Zone 23℃ ± 3℃
Clean Room Class 10 Class